发明名称 METAL VAPOUR DEPOSITION UNIT
摘要 <p>The invention relates to a plant for depositing by evaporation a metal material on a plate, comprising a housing (20) provided at the top with a linear conveyor (28) for at least one plate (1), the surface to be treated facing downwards, and at the bottom with at least two evaporation sources (31) arranged perpendicularly to the conveying direction, each source being associated with at least one collimator (32, 33) for its beam of evaporated material, and the evaporation sources and the associated collimator being arranged so as to process the entire surface of the plate (1).</p>
申请公布号 WO1995011517(A1) 申请公布日期 1995.04.27
申请号 FR1994001195 申请日期 1994.10.17
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址