发明名称 |
PHOTOSENSITIVE RESIN COMPOSITIONS |
摘要 |
The three component photosensitive resin compsn. used in the formation of a micropattern for the mfr of semiconductor devices is composed of 100 wt. pts. of an alkali-soluble resin i.e. novolac resin contg. an aromatic ring, 5˜40 wt. pts. of a phosphagen cpd. of formula (I) [R=-COO(CCH3)3; x=3 or 4 protected with a t-butoxy carbonyl (t-BOC) gp. as a disslution inhibitor, and 1˜20 wt. pts. of an onium salt of formula ArnX+Y- [Ar=aromatic hydrocarbon gp.; n=1˜3; X=halogen or S; Y=BF4, PF6, AsF6, SbF6, CF3 or SO3 , an organic sulfonic ester or a pyrogallol sulfonic ester cpd. as a photoacid generator.
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申请公布号 |
KR950004198(B1) |
申请公布日期 |
1995.04.27 |
申请号 |
KR19920015242 |
申请日期 |
1992.08.25 |
申请人 |
KIST |
发明人 |
AN, KWANG - DOK;KANG, JONG - HUI;PARK, YONG - CHOL;KIM, SONG - JU;KIM, SANG - TAE |
分类号 |
G03F7/004;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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