发明名称 MANUFACTURE OF THIN FILM OF FERROELECTRIC SUBSTANCE
摘要 PURPOSE:To provide a method of manufacture of a thin film of a ferroelectric substance which has uniform crystal grain sizes and has no phases formed therein that are different from a perovskite phase. CONSTITUTION:A thin film of crystallites of lead zirconate titanate is formed on a silicon substrate which is held at 350 deg.C to 450 deg.C, and the thin film of crystallites is heat treated at 700 deg.C for about 10 minutes for crystallization. Sputtering is utilized to form the thin film of lead zirconate titanate in a crystallitic state, at which time the temperature of the substrate is 350 deg.C to 450 deg.C.
申请公布号 JPH07111107(A) 申请公布日期 1995.04.25
申请号 JP19930280033 申请日期 1993.10.13
申请人 TDK CORP 发明人 SHIRAKAWA YUKIHIKO
分类号 H01L27/10;H01B3/00;H01B3/12;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108 主分类号 H01L27/10
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