| 摘要 |
<p>PURPOSE:To inhibit growth of a spontaneous oxide film during storage by providing a wafer storage house equipped with a fluid circulation system, an inert fluid storage tank, a flow controller for valve, etc. CONSTITUTION:A wafer storage house 10 is equipped with wafer storage shelves 15, 16, a wafer cassette transfer unit 70, a fluid circulation system for feeding an inert fluid to the back of the wafer storage shelves 15, 16 thence to the transfer unit 70 side through a filter 20, etc. The wafer storage house 10 is further equipped with pass boxes 30, 31 disposed at the inlet and outlet thereof, an inert fluid storage tank 40, gas supply pipings 41-43 provided with valves 51-53, and a flow controller 50 for the valves 51-53. The wafer storage room 14 is constantly filled with inert gas thus inhibiting growth of a spontaneous oxide film the surface of a wafer.</p> |
