发明名称 DRY-ETCHING APPARATUS
摘要 <p>PURPOSE:To provide a electrostatic chucking electrode where the electrostatic attraction will not be degraded. CONSTITUTION:A mounting base 3 is attached in a vacuum container 1, and an electrostatic chuck 4 which attracts an object to be processed with an electrostatic force is fixed on that mounting base 3. This electrostatic chuck 3 consists of an electrode plate 7 made of a metal thin film, an upper insulation layer 10 and lower insulation layer 11 bonded to both sides of the electrode plate. A ceramic layer 12 is formed on the surface of the upper insulation layer 10.</p>
申请公布号 JPH07106303(A) 申请公布日期 1995.04.21
申请号 JP19930243063 申请日期 1993.09.29
申请人 SHIBAURA ENG WORKS CO LTD 发明人 TAKEISHI KOJI
分类号 C23F4/00;H01L21/302;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/306 主分类号 C23F4/00
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