ROTARY TYPE SUBSTRATE TREATER

摘要

PURPOSE:To suppress the generation of floating mists and to prevent a treating liquid from readhering to a substrate. CONSTITUTION:A substrate cleaning device 1 is a device which cleans the surface of a square-shaped substrate W with a cleaning liquid while the substrate W is rotated and is provided with a substrate holding part 2, a rotary shaft 7 and a brush cleaning mechanism 3. The holding part 2 has a recessed part A for housing the substrate W on its upper end part and the whole upper surface of the holding part 2 is formed into a circular form in a state that the substrate W is housed in the recessed part A. The shaft 7 rotates the holding part 2 round its center. The mechanism 3 feeds the cleaning liquid to the substrate W held by the holding part 2.