| 摘要 |
PURPOSE:To make it possible to clean a substrate treating part even if a substrate treater is manufactured into a constitution, wherein a substrate is held by vacuum suction, by a method wherein at the time of feeding of a cleaning liquid, the cleaning liquid is prevented from infiltrating in a suction holding region where the substrate is clamped. CONSTITUTION:A spin coater SC is a device which applies photoresists to a substrate W one sheet by one sheet and is provided with a substrate treating part comprising a substrate holding part 2 and an upper rotary plate 3, a treating liquid feeding part 6, an upper rotary plate cleaning part 8 and a whole control part. The substrate treating part performs a treatment on the substrate W clamped by a substrate vacuum-clamping part 10 of the holding part 2. The feeding part 6 feeds a treating liquid on the clamped substrate W. The cleaning part 8 feeds a cleaning liquid on the plate 3 of the substrate treating part. The control part controls each part so that when the cleaning part 8 feeds the cleaning liquid on the rotary plate 3, the part 10 is shielded with a dummy substrate. |
