| 摘要 |
<p>PURPOSE:To improve uniformity of plasma treatment of a member to be treated by partially applying the same state plasma all over the surface of the treatment range of the member to be treated. CONSTITUTION:In a plasma treatment equipment 1 wherein a member W to be treated is put on a mounting stand 4 in an airtightly constituted treatment chamber 2, and the member W to be treated is treated by generating plasma, a local plasma generating means 31 which is arranged so as to face the mounting stand 4 and partially applies plasma to the member W to be treated, and a transfer means 41 which relatively transfers the local plasma generating means 31 and the mounting stand 4 are installed.</p> |
