| 摘要 |
<p>PURPOSE:To prevent etching of an insulative polymer organic film. CONSTITUTION:A mounting stand 2 is arranged in a vacuum chamber of a plasma isolation type chemical dry etching equipment, and consists of an aluminum plate 11 and an electrostatic chuck 12 fixed on the aluminum plate 11. The electrostatic chuck 12 consists of an electrode 13 made of a metal thin film, an insulative polymer organic film 14 surrounding the whole part of the electrode 13, and fluororesin 19 covering the exposed part of the polymer organic film 14.</p> |
