发明名称 PROCEDIMENTO PER LA LAVORAZIONE DI WAFER SOTTILI E CELLE SOLARI DI SILICIO CRISTALLINO
摘要 <p>The method involves processing a thin semiconductor wafer (1) to produce a curved form. In an initial stage, a protective layer (2), e.g. an organic polymer, is formed on both surfaces. The polymer may be provided in the form of a paste that is pressed onto the surface. The laminated shape is formed to the surface of a carrier (4) and can be bonded into position using a thermoplastic adhesive foil (3). <IMAGE></p>
申请公布号 ITMI950819(D0) 申请公布日期 1995.04.21
申请号 IT1995MI00819 申请日期 1995.04.21
申请人 SIEMENS AKTIENGESELLSCHAFT;SIEMENS SOLAR GMBH 发明人
分类号 C30B33/00;H01L21/02;H01L21/312;H01L31/0216;H01L31/036;H01L31/04;H01L31/18;(IPC1-7):H01L21/30 主分类号 C30B33/00
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