发明名称 |
PROCEDIMENTO PER LA LAVORAZIONE DI WAFER SOTTILI E CELLE SOLARI DI SILICIO CRISTALLINO |
摘要 |
<p>The method involves processing a thin semiconductor wafer (1) to produce a curved form. In an initial stage, a protective layer (2), e.g. an organic polymer, is formed on both surfaces. The polymer may be provided in the form of a paste that is pressed onto the surface. The laminated shape is formed to the surface of a carrier (4) and can be bonded into position using a thermoplastic adhesive foil (3). <IMAGE></p> |
申请公布号 |
ITMI950819(D0) |
申请公布日期 |
1995.04.21 |
申请号 |
IT1995MI00819 |
申请日期 |
1995.04.21 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT;SIEMENS SOLAR GMBH |
发明人 |
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分类号 |
C30B33/00;H01L21/02;H01L21/312;H01L31/0216;H01L31/036;H01L31/04;H01L31/18;(IPC1-7):H01L21/30 |
主分类号 |
C30B33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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