Phase-shifting mask and production method therefor

摘要

A phase-shifting mask according to the present invention has a crystal substrate (quartz substrate) (1) which transmits exposure light, a transmitting layer (10), of predetermined transmittance, which is formed on the main surface of the crystal substrate (1), a light-transmitting section (7) through which the crystal substrate (1) is exposed in a predetermined region, and a phase-shifting section (4) which is formed from a single material on the light-transmitting layer (10) and which shifts the phase angle through approximately 180 DEG and has a transmittance of 3-20% with respect to the exposure light transmitted through the light-transmitting section (7). One result is, that a defect produced in the phase-shifting section can be detected by means of an ordinary defect-checking device without disturbing the phase-shifting section as a phase-shifting mask. <IMAGE>