Method for controlling the particle removal from a target object

摘要

The invention relates to a method for controlling a particle beam during thermal removal (sublimation, evaporation) of material from a target object, such as is used, for example, for electron-beam evaporation, which is intended to achieve crater-free removal. A movement, which is slow in comparison with the thermal inertia, of the beam position, which can be carried out in combination with a fast movement for wobbling, guides the removal point over the material stock in such a manner that a uniform removal is performed which avoids craters. If this slow movement is controlled by a computer, the movement sequence can constantly be optimised from measured data obtained during the movement. Electron-beam evaporation of sublimated materials (e.g. graphite), in particular for layer separation.