发明名称 PROCESS FOR MANUFACTURING INTEGRATED MICROCIRCUITS.
摘要 The process involves: initially gluing a semiconducting crystal (7) at the face bearing the contact surfaces (8) to a polymer film (1); arranging and securing the polymer film (1) in a compression mould (13) so as to create a gap (14) between the surface of the compression mould (13) and the polymer film (1) along its entire length except in the vicinity of the contact surfaces (8); shaping the polymer substrate (23) of the integrated microcircuit; removing the polymer film (1) from the contact surfaces (8); heat-treating the substrate (23) and creating electrical connections between the contact surfaces (8) and the metal output terminals of the terminal frame. <IMAGE>
申请公布号 EP0637196(A4) 申请公布日期 1995.04.19
申请号 EP19930905673 申请日期 1993.01.15
申请人 SANDEROV VILYAM LAZAREVICH;TSAREV VIKTOR NIKOLAEVICH;DYAKOV JURY NIKOLAEVICH;POPOV ALEXANDR ANATOLIEVICH;EREMEEV MIKHAIL PETROVICH;MOROZOV VYACHESLAV VIKTOROVICH 发明人 SANDEROV VILYAM LAZAREVICH;TSAREV VIKTOR NIKOLAEVICH;DYAKOV JURY NIKOLAEVICH;POPOV ALEXANDR ANATOLIEVICH;EREMEEV MIKHAIL PETROVICH;MOROZOV VYACHESLAV VIKTOROVICH
分类号 H01L21/56;H01L21/68;H01L23/31;H01L23/495 主分类号 H01L21/56
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