发明名称 Process for planarizing substrate surfaces for magnetic thin film heads.
摘要 <p>A process for forming dielectric thin film coating suitable for use in magnetic thin film heads includes the application of a spin-on-glass material on a substrate, the spinning of the substrate, the preheating of the substrate and thin film to remove the solvents in the spin-on-glass material, and the heating in a reducing or in an inert atmosphere of the film to provide a conversion to a SiO2 film. The reducing and the inert atmospheres permit carbon to be left in the film. The presence of the carbon improves structural properties of the thin films. &lt;IMAGE&gt;</p>
申请公布号 EP0648862(A1) 申请公布日期 1995.04.19
申请号 EP19940420243 申请日期 1994.09.12
申请人 EASTMAN KODAK COMPANY 发明人 YANG, DANNY DWAN LI, C/O EASTMAN KODAK COMPANY
分类号 B05D1/40;C03C14/00;C23C18/12;G11B5/31;G11B5/39;(IPC1-7):C23C18/12 主分类号 B05D1/40
代理机构 代理人
主权项
地址