发明名称 |
Process for planarizing substrate surfaces for magnetic thin film heads. |
摘要 |
<p>A process for forming dielectric thin film coating suitable for use in magnetic thin film heads includes the application of a spin-on-glass material on a substrate, the spinning of the substrate, the preheating of the substrate and thin film to remove the solvents in the spin-on-glass material, and the heating in a reducing or in an inert atmosphere of the film to provide a conversion to a SiO2 film. The reducing and the inert atmospheres permit carbon to be left in the film. The presence of the carbon improves structural properties of the thin films. <IMAGE></p> |
申请公布号 |
EP0648862(A1) |
申请公布日期 |
1995.04.19 |
申请号 |
EP19940420243 |
申请日期 |
1994.09.12 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
YANG, DANNY DWAN LI, C/O EASTMAN KODAK COMPANY |
分类号 |
B05D1/40;C03C14/00;C23C18/12;G11B5/31;G11B5/39;(IPC1-7):C23C18/12 |
主分类号 |
B05D1/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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