| 摘要 |
PURPOSE:To improve the uniformity in film thickness by changing the space between a heating element and the surface of a substrate with respect to the position to uniformize the substrate surface temp. CONSTITUTION:A substrate supporting plate 4 with the thickness at the upper part made smaller than that at the lower part is set on a water-cooled cooling holder 5, and substrates 2 are arranged thereon, the holder 5 can be moved before or during synthesis, and the space between the element 1 and substrate 2 is adjusted in accordance with the temp. distribution on the substrate surface measured by a thermocouple 3. A power is supplied on the element 1 to produce heat, the mixed gaseous reactant consisting of hydrocarbons and hydrogen is supplied from a nozzle below the element 1, the passage is regulated by a shielding plate 6 arranged on both side face parts of the substrate 2 and substrate supporting plate 4, and the mixed reactant is efficiently introduced around the substrate 2. The gaseous reactant is thermally decomposed by the element 1 at >= about 2000 deg.C, and a homogeneous diamond film is formed in uniform thickness on the substrate 2 kept at >= about 500 deg.C and with the surface temp. distribution uniformized. |
