| 摘要 |
A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas: <IMAGE> (I) <IMAGE> (II) wherein R1 and R2 each represent hydrogen, halogen, -OCOR3, alkyl or alkoxy in which R3 represents alkyl or phenyl, x and y each represent 1, 2 or 3, and R, Ro, R' and Ro' each represent hydrogen atom, alkyl or phenyl group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinonediazide material. This composition is excellent in the balance between properties such as resolution, profile and depth of focus.
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