发明名称 Semiconductor device, an image sensor device, and methods for producing the same
摘要 A semiconductor device according to the present invention includes: a light-transmitting substrate having a first surface and a second surface; a circuit conductor layer formed on the first surface of the light-transmitting substrate; a semiconductor chip having electrodes formed on a surface thereof, the semiconductor device being mounted face-down on the first surface of the light-transmitting substrate; a photo-thermal cross-linkable insulating resin layer for fixing the semiconductor chip on the light-transmitting substrate; a plated metal layer formed on at least a portion of the circuit conductor layer, the electrodes of the semiconductor chip being connected to the circuit conductor layer through the plated metal layer; an alloy layer formed in an abutting portion between each plated metal layer and the circuit conductor layer; and a second alloy layer formed in an abutting portion between each electrode and each plated metal layer, the alloy layers being formed by melting and recoagulating the plated metal layer upon the circuit conductor layer.
申请公布号 US5408121(A) 申请公布日期 1995.04.18
申请号 US19930131125 申请日期 1993.10.04
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 NAKAMURA, TETSURO;TANAKA, EIICHIRO;FUJIWARA, SHINJI;NAKAGAWA, MASAHIRO
分类号 H01L21/56;H01L21/60;H01L31/0203;(IPC1-7):H01L27/14;H01L31/00 主分类号 H01L21/56
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