发明名称 |
Anti-contaminating adsorbed film and method of manufacturing the same |
摘要 |
This invention provides for an anti-contaminating film which is adsorbed to a substrate surface. The film contains a -Si- group and fluorocarbon group. The -Si- group is covalently bonded to the substrate surface. It also provides a forming method of an anti-contaminating film on a hydrogen active substrate surface by contacting the substrate surface with a non-aqueous solution, containing a surface active material having fluorocarbon groups and chlorosilane groups, the substrate surface having active hydrogen groups, removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making a monomolecular precursor film, reacting chlorosilane groups unreacted in the adsorbed monomolecular a precursor film with water after the removing step, and drying the adsorbed monomolecular film.
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申请公布号 |
US5407709(A) |
申请公布日期 |
1995.04.18 |
申请号 |
US19930148499 |
申请日期 |
1993.11.08 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
OGAWA, KAZUFUMI;MINO, NORIHISA;SOGA, MAMORU |
分类号 |
B05D1/18;C03C17/42;C08J7/04;C09D4/00;C09D183/02;C09D183/08;(IPC1-7):B05D3/06 |
主分类号 |
B05D1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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