发明名称 Anti-contaminating adsorbed film and method of manufacturing the same
摘要 This invention provides for an anti-contaminating film which is adsorbed to a substrate surface. The film contains a -Si- group and fluorocarbon group. The -Si- group is covalently bonded to the substrate surface. It also provides a forming method of an anti-contaminating film on a hydrogen active substrate surface by contacting the substrate surface with a non-aqueous solution, containing a surface active material having fluorocarbon groups and chlorosilane groups, the substrate surface having active hydrogen groups, removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making a monomolecular precursor film, reacting chlorosilane groups unreacted in the adsorbed monomolecular a precursor film with water after the removing step, and drying the adsorbed monomolecular film.
申请公布号 US5407709(A) 申请公布日期 1995.04.18
申请号 US19930148499 申请日期 1993.11.08
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 OGAWA, KAZUFUMI;MINO, NORIHISA;SOGA, MAMORU
分类号 B05D1/18;C03C17/42;C08J7/04;C09D4/00;C09D183/02;C09D183/08;(IPC1-7):B05D3/06 主分类号 B05D1/18
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