首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Method of producing CVD silicon oxynitride film.
摘要
申请公布号
EP0481706(B1)
申请公布日期
1995.04.12
申请号
EP19910309441
申请日期
1991.10.15
申请人
KAWASAKI STEEL CORPORATION
发明人
SATO, NOBUYOSHI, C/O KAWASAKI STEEL CORPORATION
分类号
H01L21/318;C23C16/30;H01L21/314;(IPC1-7):H01L21/314
主分类号
H01L21/318
代理机构
代理人
主权项
地址
您可能感兴趣的专利
A phase tracking system
Fibrous absorbent articles having malodor counteractant
Polynucleotides encoding two novel human g-protein coupled receptors, hgprbmy28 and hgprbmy29, and splice variants thereof
Water based adhesive
Purchasable content distribution with shopping cart having segregated digital download content and physical storage media
Method for the treatment of polycystic kidney disease
UGELLO PER STAMPI DI INIEZIONE DI MATERIE PLASTICHE.
TUBO DI SUPPORTO PER L'AVVOLGIMENTO DI FILATI IN BOBINA
ELEMENTO DI RINFORZO PARTICOLARMENTE PER CALZATURE SPORTIVE
OPTIMIZED AUTOMATIC WAREHOUSE
CONTENITORE PER LA CONSERVAZIONE DI PRODOTTI COSMETICI.
VASSOI MONOUSO PER PIZZE A FONDO RETICOLATO ESAGONALE.
COMPOSIZIONI DETERGENTI
PROCEDIMENTO E DISPOSITIVO PER INCREMENTARE LA PUREZZA DELL'ACQUA PRODOTTA CON DISSALATORI EVAPORATIVI
Datamonitor/bildskärm med 2 st eller fler bildrutoe i
Hydraulisk fordonsretarder
STRUTTURA DI SCI
Portable, adaptable set lighting system
Reconfigurable free space wavelength cross connect
Method for enhancing the translation and expression of recombinant proteins
