| 摘要 |
A method for producing a mask pattern for a semiconductor integrated circuit includes dividing the mask pattern data into a plurality of lower level cells and an upper level cell having wiring lines for providing connections between the lower level cells, extracting inter-cell connection information from the mask pattern data, changing the dimensions of the lower level cells by predetermined ratios to conform to a design standard, and changing the wiring lines of the upper level cell to retain the connection between the lower level cells in accordance with the inter-cell connection information extracted. |
