| 摘要 |
PURPOSE:To constantly exposure an improved image on a light-sensitive substrate even if the position relationship for the projection optical system of reticle changes due to scanning when performing projection exposure by the step-and-scan system. CONSTITUTION:The position relationship between reticle R and a projection optical system PL within a slit-shaped illumination region 1 is measured as a function of position in scanning direction of the reticle R and is stored in a memory 17. When performing sccording exposure, the amount of displacement of an image surface according to the projection optical system PL is obtained from a function which is stored according to the scanning position of the reticle R and the exposure surface of the wafer W is aligned with the changed image surface via a Z leveling stage 10. |
