| 摘要 |
PURPOSE:To form a heat-resistant pattern high in fidelity without being impaired in pattern precision by ununiform thickness of a photosensitive layer and fluctuation of focal distance and to enlarge its focal latitude. CONSTITUTION:The alkali-developable positive type photosensitive resin composition comprises an alkali-soluble novolak resin and an ester of 1, 2-quinonediazido and a hydroxyl compound having a weight average molecular weight of 400-2000 in terms of polystyrene obtained by condensing phenol with hydroxybenzaldehyde in the presence of an acid catalyst, and, if necessary, a compound represented by formula in which at least one of D is naphthoquinonediazido-1, 2- diazidosulfonyl group and the others are H atoms. |
