发明名称 DEVELOPMENT PROCESSING METHOD FOR PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To shorten development time and to prevent staining of a back ground by exposing the photosensitive material obtained by forming a coloring material layer containing a pigment on a thermoplastic resin layer and removing nonimage parts with a developing solution containing an alkali agent and an aromatic carboxylic acid or its salt. CONSTITUTION:A thermoplastic resin is used for the layer acting as a heat softened layer and a releasble layer and the heat softened layer comprises, for example, a vinyl acetate-ethylene copolymer, alcohol-soluble polyamide, polyvinyl acetate, or the like, and the releasable layer comprises, for example, silicone resins, and examples of a photosensitive material as the coloring material layer, are a system of a diazonium salt or its condensate mixed with polyvinyl alcohol or polyvinylpyrrolidone and the like. These photosensitive material are imagewise-exposed and the nonimage part is removed with the developing solution containing alkali agent, such as calcium silicate or the like.
申请公布号 JPH0792690(A) 申请公布日期 1995.04.07
申请号 JP19930236759 申请日期 1993.09.22
申请人 KONICA CORP 发明人 HIRAI KATSURA;TANIGUCHI TETSUYA;SHIMIZU KUNIO
分类号 G03F7/004;G03F3/10;G03F7/30;G03F7/32;(IPC1-7):G03F7/30 主分类号 G03F7/004
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