| 摘要 |
PURPOSE:To provide a photosensitive resin compsn. excellent in film characteristics, heat resistance, adhesive property and image forming property without requiring a troublesome producing process and without causing contamination by a chloride, etc. CONSTITUTION:This photosensitive resin compsn. is a positive type photosensitive resin compsn. contg. an alkali-soluble polymer having carboxyl groups and/or phenolic hydroxyl groups and a compd. generating an amine compd. by irradiation with light as essential components. The top of a coating film of this photosensitive resin compsn. is irradiated with active light through a patterned mask and the irradiated part is removed by development to produce the objective relief pattern. |
