| 摘要 |
PURPOSE:To provide an X-ray projection aligner, with.lighting optical system which is capable of incoherent lighting of a mask and hence can maximize the performance of an image-forming system. CONSTITUTION:The title device consists of at least an X-ray source 6, a lighting optical system 5 for applying X rays emitted from the X-ray source 6 to a mask 9, and a projection optical system 10 for forming the image of the pattern formed on the mask 9 on a wafer 11 by projection. Therefore, at least one mirror out of mirrors constituting the lighting optical system 5 is a spherical surface mirror 1 which is formed by forming an X-ray reflection multilayer film on a substrate surface with spherical surface shape and the spherical mirror 1 is provided at a position where incidence X rays enters the spherical mirror 1 nearly vertically. Also, the spherical surface mirror 1 has a radius of curvature and outer diameter where the dispersion angle of reflection X rays focused on the mask 9 laid out near the focus point of the spherical mirror 1 nearly matches the numerical aperture incidence side of the projection optical system 10. |
