| 摘要 |
PURPOSE:To reduce the rate of production of breakage of a silicon cell and cracking caused by the action upon handling and the action of external stress. CONSTITUTION:A portion 9 not forming a non-reflection pattern 2 is formed in the vicinity of an external edge on the surface of a silicon cell 1 that uses a (100) plane as a photodetecting surface, and the surface of the silicon cell is formed with four sides thereof not coincident with cleavage directions <010>, <001> of a silicon substrate 5. Sufficient thickness of the silicon cell 1 is secured at ends of the silicon cell whereby breakage and cracking from these portions are prevented from being produced, and the direction of welding and the direction of cleavage are prevented from being coincident with each other whereby welding strain is prevented from being stored. |
