| 摘要 |
PURPOSE:To obtain a photoresist compsn. having satisfactory sensitivity, excellent in solubility to a developer and giving a resist film excellent in heat resistance. CONSTITUTION:A positive type photoresist compsn. contg. alkali-soluble novolak resin and a 1,2-quinonediazido compd. or contg. alkali-soluble novolak resin having introduced 1,2-quinonediazido groups is blended with a single-dispersed polyhydroxystyrene polymer represented by the formula (where each of R<1> and R<2> is a 1-6C alkyl or H) and having a wt. average mol.wt. of 3,000-50,000 and a dispersion of 1.01-2.0 as a dissolution accelerator to obtain the objective photoresist compsn. |
