| 摘要 |
PURPOSE:To obtain excellent sensitivity, resolution, and especially, coating property for a spin coating method on a substrate having a large diameter by using a mixture solvent containing butyl acetate and 3-ethoxypropionate. CONSTITUTION:This radiation-sensitive resin compsn. is obtd. by dissolving a resist in a solvent. In this resist, acid is produced by irradiation with radiation and the solubility of the irradiated part to a developer is changed by the catalytic effect of the produced acid to form a pattern. The solvent used is a mixture solvent containing butyl acetate and 3-ethoxypropionate. The compsn. is a resist compsn. (a) comprising a resin containing a group which can be decomposed with acid, radiation-sensitive acid-producing agent, and mixture solvent containing butyl acetate and 3-ethoxypropionate, a compsn.(b) comprising an alkali-soluble resin, radiation-sensitive acid-producing agent, dissolution- controlling agent, and mixture solvent containing butyl acetate and 3- ethoxypropionate, or a compsn.(c) containing 3-ethoxypropionate. |
