| 摘要 |
A non-contact method for measuring the composition-dependent phase change on reflection that occurs using profile measuring interferometry. A profile measuring interference microscope (10) utilizing an extended, narrow bandwidth illumination source (12) is used to generate a two-beam interference intensity pattern at a given field position on a detector array (30). A reference surface (24) of known surface characteristics and an unknown test surface (32) being profiled are axially translated relative to each other while the interference intensity pattern impinging on the detector array (30) is sampled, digitized, stored and then utilized to produce a digitized two-beam interference intensity pattern, the shape of which is characteristic of the particular interferometer configuration.
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