| 摘要 |
PURPOSE:To provide a surface pressure uniformizing device for a polishing tool whereby a pressure is variably generated so as to obtain pressing force to a workpiece in desired distribution, so that the device can easily cope with fluctuation of the pressing force and rigidity of the workpiece, hardness of the polishing tool, etc., CONSTITUTION:A device comprises a plurality of magnetic field generators 3, 5, 7, plurality of magnetic paths for guiding a magnetic field from these magnetic field generators 3, 5, 7 to a prescribed position, magnetic fluid 21 included in a bag-shaped unit 23 provided in end parts of these magnetic paths and a weak rigid unit 25 provided in an opposite side to the magnetic path end part through the magnetic fluid 21 while covering a plurality of the magnetic path end parts. |
