| 摘要 |
Detection apparatus for determining measured values of, for example, absorptions of substances in the gas, liquid and/or solid phase, reflectance characteristics of thin layers and substrates, and for monitoring dynamic and/or repetitive processes by means of absorption and/or reflection. The apparatus is provided with a pulsed radiation source and a resonant cavity (resonator cavity) which contains at least part of the said substances, thin layers and/or substrates. A sensor system detects the radiation from the resonant cavity, and a monitoring unit determines the desired measured values on the basis of the detected time-dependent intensity trend of radiation in the resonant cavity. In the process, the radiation source emits pulsed radiation over a wide-band range, and the monitoring unit determines said measured values as a function of frequency components of radiation pulses emitted by the radiation source and injected into the resonant cavity. <IMAGE>
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