RADIATION SENSITIVE RESIN COMPOSITION

摘要

PURPOSE:To provide a radiation sensitive resin composition ideal as chemical amplification type resist excellent in sensitivity, resolution, and the like, specially excellent in coating property to a large-bored base by a spin-coating method by using a mixed solvent formed of a specific composition. CONSTITUTION:Resist for forming a pattern by generating acid by the irradiation of radiation and changing the solubility of a radiation irradiated part to a developer by chemical change due to the catalytic action of the acid is dissolved in a solvent to form a radiation sensitive resin composition. The solvent in this case is a mixed solvent containing alkylester lactate (lactic acid group solvent), propylene glycolalkylether (propylene glycolether group solvent) and/or propylene glycolalkylether acetate (propylene glycolacetate group solvent).