| 摘要 |
<p>PURPOSE:To provide an electrostatic chuck which is capable of generating a Johnsen-Rahbeck force stable and least. CONSTITUTION:As an electrostatic chuck is capable of keeping a current which flows between a work W and insulating films 5a and 5b constant in intensity by a constant current power supply 8, it is able to make a required Johnsen- Rahbeck force act between the insulating film 5a and the work W even if a self-bias which is generatede when a high frequency power is applied is changed in potential, so that a stable electrostatic attraction can be realized. Furthermore, as an electrostatic chuck is so structured that a current which is the least to generate a Johnsen-Rahbeck force large enough to enable the insulating film to hold a work W by attracting is made to flow through an electrode by the constant current power supply 8, a flowing current causes no damage to an integrated circuit formed on the work even if the work W is fully attracted and hold by the electrostatic chuck.</p> |
