发明名称 PHOTOPOLYMERIZED COMPOSITION
摘要 PURPOSE:To provide a photopolymerized composition of high sensitivity to visible light, specially to long wavelength light by containing a specific sensitizer and an electron donating compound in a photopolymerization initiator. CONSTITUTION:A photopolymerized composition containing a compound having at least one ethylenic unsaturated double-bond that can be addition-polymerized, and a photopolymerization initiating system. This photopolymerization initiating system contains at least one kind of sensitizer expressed by a formula, and at least one kind of electron donating compounds. In the formula, R<1>-R<4> respectively represent a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and R<5>-R<8> respectively represent a chlorine atom, a bromine atom or an iodine atom, but excludes the case of all R'-RP representing hydrogen atoms and all R<5>-R<8> representung brommne atoms. The sensitizer expressed by the formula has xanthene pigment structure and ester peroxide structure in molecules, and one or two kinds or more of this sensitizer can be jointly used.
申请公布号 JPH0784367(A) 申请公布日期 1995.03.31
申请号 JP19930227524 申请日期 1993.09.13
申请人 MITSUBISHI CHEM CORP 发明人 YAMAOKA TSUGIO;URANO TOSHIYOSHI;TSUCHIYAMA MASAAKI;NAGASAKA HIDEKI
分类号 G03C1/675;G03F7/00;G03F7/004;G03F7/027;G03F7/028;G03F7/038;H01L21/027;(IPC1-7):G03F7/028 主分类号 G03C1/675
代理机构 代理人
主权项
地址
您可能感兴趣的专利