发明名称 METHOD AND DEVICE FOR THE CONTROLLED FORMING AND FEEDING OF A GASEOUS ATMOSPHERE HAVING AT LEAST TWO COMPONENTS, AND APPLICATION IN PLANTS OF THERMAL OR CARBURIZING TREATMENT
摘要 <p>A method for the forming and feeding of a gaseous atmosphere having two components, at least one of which under the form of vapour obtained from liquid, envisages to bubble a first gaseous component within a liquid component kept under controlled conditions of pressure and temperature and then to remove the gas-vapour mixture having controlled composition. In order to realise the method according to the invention, a device is foreseen that comprises a saturator reservoir containing the liquid component, means to keep the level of the liquid in the reservoir substantially constant, means to bubble a flow of gaseous component within the saturator, as well as means to control pressure and temperature inside the saturator itself. The invention can be applied in particular to the forming of carburizing atmospheres and of atmospheres used in thermal treatments of steel materials, specially gas carburizing treatments.</p>
申请公布号 WO1995008387(A1) 申请公布日期 1995.03.30
申请号 EP1994002918 申请日期 1994.09.02
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