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发明名称
SEMICONDUCTOR WAFER PROCESSING CVD REACTOR CLEANING METHOD AND APPARATUS.
摘要
申请公布号
EP0644954(A1)
申请公布日期
1995.03.29
申请号
EP19930916504
申请日期
1993.06.11
申请人
MATERIALS RESEARCH CORPORATION
发明人
FOSTER, ROBERT, F.;REBENNE, HELEN, E.;LEBLANC, RENE, E.;WHITE, CARL, L.;ARORA, RIKHIT
分类号
C23C16/14;C23C16/44;C23C16/455;C23C16/48;C23C16/54;H01J37/32;H01L21/00;H01L21/205;H01L21/31;H01L21/683;(IPC1-7):C23C16/14;H01L21/285
主分类号
C23C16/14
代理机构
代理人
主权项
地址
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