发明名称 |
Method for controlling a collimated sputtering source. |
摘要 |
A method for automatically controlling a collimated sputtering source that is controllable by a computer to compensate for the build-up of sputtered material on the collimator. The method involves providing software for the computer including a formula to calculate a multiplier as a function of the age of the collimator, sequentially depositing film on a series of substrates using the sputtering source, monitoring the age of the collimator, and using the software to periodically adjust the value of a controllable sputtering parameter as a function of the multiplier. The sputtering parameter is automatically adjusted by the software such that a property of the film deposited by the source on the series of substrates does not substantially vary among the substrates as sputtered material builds up on the collimator. <IMAGE> |
申请公布号 |
EP0645469(A1) |
申请公布日期 |
1995.03.29 |
申请号 |
EP19940306776 |
申请日期 |
1994.09.15 |
申请人 |
VARIAN ASSOCIATES, INC. |
发明人 |
ACTOR, GERI M.;HOFFMAN, VANCE E., JR.;PATTERSON, PAMELA R.;HIGA, STEPHEN M.;MILLER, PATRICK O. |
分类号 |
C23C14/34;C23C14/54;H01L21/203 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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