发明名称 Radiation-sensitive composition containing a resole resin and a novolak resin and use thereof in lithographic plates.
摘要 A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid and (4) an infrared absorber. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.
申请公布号 EP0625728(A3) 申请公布日期 1995.03.29
申请号 EP19940201359 申请日期 1994.05.13
申请人 EASTMAN KODAK CO 发明人 HALEY NEIL FREDERICK C O EASTM;CORBIERE STEVEN LEO C O EASTMA
分类号 B41C1/05;B41C1/10;B41M5/36;G03F7/00;G03F7/004;G03F7/023;G03F7/029;G03F7/09;G03F7/20;G03F7/38;(IPC1-7):G03F7/004 主分类号 B41C1/05
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