APPARATUS FOR COATING A SUBSTRATE

摘要

A coating applicator is provided for depositing a film on a surface of glass (12) and other substrates by chemical vapor deposition. The applicator includes a pair of opposing coating nozzles (10a and 10b) for applying a vaporized coating chemical reactant in a carrier gas to the surface at such a concentration and velocity that coating of the surface is achieved under substantially reaction rate controlled conditions. Each coating nozzle (10a and 10b is positioned adjacent the surface (12) with a small clearance (C) therebetween which is open to the outside atmosphere. The opposing coating nozzles are directed toward each other at a selected angle with respect to a normal to the surface (12) of the substrate. The angle and the clearance provides a condition where there is substantially no intermixing of coating vapors with the outside atmosphere.