发明名称 Patterning method employing laser
摘要 A patterning method includes the steps of irradiating an excimer laser beam to a material layer so as to form a pattern on the material layer; and transferring onto a substrate, the material layer formed with the pattern; and irradiating the excimer laser beam to the material layer transferred onto the substrate so as to form a further pattern on the material layer.
申请公布号 US5401616(A) 申请公布日期 1995.03.28
申请号 US19930121194 申请日期 1993.09.15
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 ISOMI, AKIRA;HAGINO, MASATO
分类号 B41M5/26;B41M5/382;G02B5/20;G02F1/1335;G03F7/20;(IPC1-7):G03F9/00 主分类号 B41M5/26
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