发明名称 |
Patterning method employing laser |
摘要 |
A patterning method includes the steps of irradiating an excimer laser beam to a material layer so as to form a pattern on the material layer; and transferring onto a substrate, the material layer formed with the pattern; and irradiating the excimer laser beam to the material layer transferred onto the substrate so as to form a further pattern on the material layer.
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申请公布号 |
US5401616(A) |
申请公布日期 |
1995.03.28 |
申请号 |
US19930121194 |
申请日期 |
1993.09.15 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
ISOMI, AKIRA;HAGINO, MASATO |
分类号 |
B41M5/26;B41M5/382;G02B5/20;G02F1/1335;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
B41M5/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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