PROGRAMMABLE INTERCONNECT STRUCTURES AND PROGRAMMABLE INTEGRATED CIRCUITS.

摘要

An amorphous silicon antifuse (30) has a bottom electrode (38), a dielectric (40) overlying the bottom electrode, amorphous silicon (46) contacting the bottom electrode in a via in the dielectric, and the top electrode (70, 72) over the amorphous silicon. Spacers (66, 68) are provided in the via corners between the amorphous silicon and the top electrode. The spacers smooth the surface above the amorphous silicon, provide good top electrode step coverage, and reduce leakage current.