发明名称 A MULTIPLE ALLOY OHMIC CONTACT FOR A SEMICONDUCTOR DEVICE
摘要 A protruding ohmic contact on a P type or N type semiconductor region is made by depositing an alloy of gold and a conductivity type impurity on the P type or N type region, which is heated up to a eutectic temperature of gold and the semiconductor material and thereafter depositing silver on the alloy contact; the conductivity type impurity used is such as produces the same conductivity type as that of the semiconductor region.
申请公布号 US3686698(A) 申请公布日期 1972.08.29
申请号 USD3686698 申请日期 1970.12.24
申请人 HITACHI LTD. 发明人 KENJI AKEYAMA;NORIMASA MIYAMOTO
分类号 H01L21/00;H01L23/532;H01L29/00;(IPC1-7):H01L3/00;H01L5/00 主分类号 H01L21/00
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