| 摘要 |
PURPOSE:To obtain a dip developing method for photosensitive polymers by which irregular development is hardly caused and a polymer dissolved with a developer can be completely removed from a substrate by providing a developing device to be used for dip development of a photosensitive polymer film with a means to generate bubbles. CONSTITUTION:A cassette 6 is dipped in a developing tank 1. In the cassette 6, substrates 8 are set with a desired interval. By dipping the cassette 6 in a developer liquid 7 in the developing tank 1, a photosensitive polymer on the substrate 8 in an area not exposed or exposed is dissolved to form a pattern. A bubble generating device 2 is disposed in the bottom of the developing tank 1. By introducing gas to a gas inlet tube 3 of the bubble generating means 2 and generating bubbles 5 from bubbling holes 4, the effect to remove the dissolved polymer from the substrate 8 can be increased. Thus, the dissolved polymer can be completely removed from the substrate 8 without requiring an expensive facility, and thereby, a good pattern without irreglar developing can be obtd. |
