发明名称 INTERNAL WIRING STRUCTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To provide an internal wiring structure for semiconductor devices which can prevent the destruction of a case and the influence of an overcurrent on the peripheral control circuit of a semiconductor device by quickly disconnecting internal wiring when the overcurrent flows due to the fault of a semiconductor chip. CONSTITUTION:In a semiconductor device in which internal wiring is formed by wire-bonding between a semiconductor chip 4 mounted on the conductor pattern 3 of an insulating substrate 2 and leading-out terminals 5, an Si relay electrode, 9 having a conductivity is provided at least on the internal wiring route between input-side leading-out terminals and the chip 4 and Al wires 6 and 10 are bonded between the chip 4 and external leading-out terminals through the electrode 9. Therefore, an instantaneously melting section can be constituted by reducing the number of the wires 10 wired between the electrode 9 and leading-out terminals than that of the wires 6 wired between the electrode 9 and chip 4 and the bonding sections of the wires 10 are made to be quickly melted so as to block the overcurrent when the overcurrent is generated.
申请公布号 JPH0778933(A) 申请公布日期 1995.03.20
申请号 JP19930222696 申请日期 1993.09.08
申请人 FUJI ELECTRIC CO LTD 发明人 MURAKAMI YUKIO
分类号 H01L23/58;(IPC1-7):H01L23/58 主分类号 H01L23/58
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