MONOCHROMATIZED ELECTRON BEAM SOURCE AND ITS MANUFACTURE

摘要

PURPOSE:To provide monochromatized electron beam source to be used in an electron beam device, wherein the beam source is structured simple and easy to fabricate and generates an electron beam having a very narrow energy width. CONSTITUTION:A covering film 2 having a thickness approx. corresponding to the permeation length of an electron wave is provided over the surface of a needle-shaped conductor 1, and a voltage is impressed from a power supply 5 between it and an anode 4. Thereby electrons 3 are released into the vacuum 6 by means of resonance tunnel phenomenon through a quantum level 7 produced in a barrier well layer 2' of the covering film 2.