发明名称 METHOD AND EQUIPMENT FOR REVERTING SAMPLE IN TREATING PROCESS
摘要 PURPOSE: To reduce contamination of a sample, by reversing the sample in an intermediate chamber, exposing the rear of the sample to particles and protecting the surface of the sample from process contamination. CONSTITUTION: One or a plurality of samples are accommodated in an I/O chamber 90. The sample is carried in an intermediate chamber 92, and reversed by operating an equipment 20 together with a transfer robot mechanism. After the sample is transferred to a tightly closed vacuum chamber 94 from the intermediate chamber 92, the pressure of the vacuum chamber 94 is reduced. Then the sample is transferred to a process chamber 96 in order to perform vapor deposition of the sample. Thereby the amount of contaminant which falls or deposits on the surface of the sample can be reduced, so that the sample of little contamination can be manufactured with high yield.
申请公布号 JPH0774228(A) 申请公布日期 1995.03.17
申请号 JP19940148162 申请日期 1994.06.29
申请人 TERU AMERICA INC;TOKYO ELECTRON LTD 发明人 JIYON DEII POROTSUKU;RUIIZU ESU BARISU
分类号 B65G49/07;C23C16/54;H01L21/205;H01L21/677;H01L21/687;(IPC1-7):H01L21/68 主分类号 B65G49/07
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