CONTROL OF PLASMA PARTICLE BY OUTLINING PLASMA SHEATH USING MATERIAL WITH DIFFERENT RF IMPEDANCE,申请号JP19940099767-传众专利搜索

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发明名称	CONTROL OF PLASMA PARTICLE BY OUTLINING PLASMA SHEATH USING MATERIAL WITH DIFFERENT RF IMPEDANCE
摘要
申请公布号	JPH0774067(A)	申请公布日期	1995.03.17
申请号	JP19940099767	申请日期	1994.05.13
申请人		发明人
分类号	H01L21/02;H01J37/32;(IPC1-7):H01L21/02	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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