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发明名称
Strahlungsempfindlicher Ester und Verfahren zu dessen Herstellung.
摘要
申请公布号
DE59201315(D1)
申请公布日期
1995.03.16
申请号
DE19925001315
申请日期
1992.03.30
申请人
HOECHST AG, 65929 FRANKFURT, DE
发明人
SCHELER, SIEGFRIED, DR., W-6200 WIESBADEN-NAUROD, DE;ZAHN, WOLFGANG, DR., W-6228 ELTVILLE 2, DE;SCHMITT, AXEL, DR., W-6229 WALLUF, DE;BUHR, GERHARD, DR., W-6240 KOENIGSTEIN, DE
分类号
C07C309/71;C07C309/76;C07C311/16;C07C323/66;G03F7/022;(IPC1-7):C07C309/71
主分类号
C07C309/71
代理机构
代理人
主权项
地址
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