| 发明名称 |
NEGATIVE PHOTORESIST AND A PROCESS THEREFOR |
| 摘要 |
A negative photoresist and a process for the preparation thereof. However, the negative photoresist used developers normally employed for positive photoresists. The photoresist comprises a photoactive compound, a novolac resin and a solvent. The novolac resin is subjected to the step of purification prior to it being used in the photoresist.
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| 申请公布号 |
CA2106231(A1) |
申请公布日期 |
1995.03.16 |
| 申请号 |
CA19932106231 |
申请日期 |
1993.09.15 |
| 申请人 |
NATIONAL RESEARCH DEVELOPMENT CORPORATION |
发明人 |
ESWARAN, SAMBASIVAN V. |
| 分类号 |
G03F7/008;G03F7/012;G03F7/023;G03F7/038;G03F7/085;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/008 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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