| 摘要 |
The subject-matter of the invention is an exposure device which permits a light-screening action of 100 % on closure of an optical PLZT diaphragm even if a light source remains switched on, this resulting in a very fast high-quality exposure. For this purpose, an exposure device according to the invention has the following features: a light source (1); a linearly shaped optical PLZT diaphragm (2) which extends at right angles to the course of the strip of a light-sensitive material (B) for the purpose of exposing it during its passage; a light-modulator filter unit (3) having a multiplicity of optical modulation filters (3a) which are arranged along the beam path of the light source (1) in a row; a driving mechanism (4) for the light-modulation filters (3a) which operates these individually in such a manner that they can be guided in the direction of the view path between the optical PLZT diaphragm (2) and the light source (1) and can be retracted therefrom; and a controller (5) for the filter-driving mechanism (4) which controls its movement in such a manner that a desired tinging (shading) can be achieved at a predetermined point in time. <IMAGE>
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